Abstract
A three-region model for the high n-type conductivity in InN, including contributions from the bulk, surface and buffer layer interface of the sample, is considered. In particular, a parallel conduction analysis is used to show that this model can account for the carrier concentration and mobility variation with film thickness that has previously been determined from single-field Hall effect measurements. Microscopic origins for the donors in each region are considered, and the overriding tendency towards n-type conductivity is discussed in terms of the bulk band structure of InN.
| Original language | English |
|---|---|
| Pages (from-to) | 174201 |
| Number of pages | 7 |
| Journal | Journal of Physics: Condensed Matter |
| Volume | 21 |
| Issue number | 17 |
| DOIs | |
| Publication status | Published - 29 Apr 2009 |
Keywords
- MOLECULAR-BEAM EPITAXY
- FUNDAMENTAL-BAND GAP
- HEXAGONAL INN
- ELECTRON ACCUMULATION
- SYNCHROTRON-RADIATION
- TERAHERTZ EMISSION
- NONPOLAR SURFACES
- POLAR INN
- SEMICONDUCTORS
- FILMS
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