Underpotential deposition of Cu on Au(111) from neutral chloride containing electrolyte

Hannah Aitchison; Nikolaus Meyerbroker; Tien-Lin Lee; Jörg Zegenhagen; Thomas Potter; Herbert A. Früchtl; Izabela Cebula; Manfred Buck

doi:10.1039/C7CP04244B

Underpotential deposition of Cu on Au(111) from neutral chloride containing electrolyte

Hannah Aitchison, Nikolaus Meyerbroker, Tien-Lin Lee, Jörg Zegenhagen, Thomas Potter, Herbert A. Früchtl, Izabela Cebula, Manfred Buck

Research output: Contribution to journal › Article › peer-review

Abstract

The structure of a chloride terminated copper monolayer electrodeposited onto Au(111) from a CuSO₄/KCl electrolyte was investigated ex situ by three complementary experimental techniques (scanning tunneling microscopy (STM), photoelectron spectroscopy (PES), X-ray standing wave (XSW) excitation) and density functional theory (DFT) calculations. STM at atomic resolution reveals a stable, highly ordered layer which exhibits a Moire structure and is described by a (5×5) unit cell. The XSW/PES data yield a well-defined position of the Cu layer and the value of 2.16 A above the topmost Au layer suggests that the atoms are adsorbed in threefold hollow sites. The chloride exhibits some distribution around a distance of 3.77 Å in agreement with the observed Moire pattern due to a higher order commensurate lattice. This structure, a high order commensurate Cl overlayer on top of a commensurate (1×1) Cu layer with Cu at threefold hollow sites, is corroborated by the DFT calculations.

Original language	English
Pages (from-to)	24146-24153
Number of pages	8
Journal	Physical Chemistry Chemical Physics
Volume	19
Issue number	35
Early online date	15 Aug 2017
DOIs	https://doi.org/10.1039/C7CP04244B
Publication status	Published - 21 Sept 2017

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Buck_PCCP_NeutralChloride_AAM
© 2017 the Authors. This work has been made available online in accordance with the publisher’s policies. This is the author created accepted version manuscript following peer review and as such may differ slightly from the final published version. The final published version of this work is available at: https://doi.org/10.1039/C7CP04244B
Accepted author manuscript, 1.08 MB

Supramolecular: Supramolecular Self-Assemblies as Nanotemplates for Electrodeposition
Buck, M. (PI)
The Leverhulme Trust
1/11/13 → 31/10/15
Project: Standard

Data Underpinning - Underpotential Deposition of Cu on Au(111) from Neutral Chloride Containing Electrolyte (dataset)
Aitchison, H. (Creator), Meyerbroeker, N. (Creator), Lee, T.-L. (Creator), Zegenhagen, J. (Creator), Potter, T. D. (Creator), Fruchtl, H. A. (Creator), Cebula, I. (Creator) & Buck, M. (Creator), University of St Andrews, 2017
DOI: 10.17630/2644a19d-8d9b-4737-8bb1-398f648e4c8a
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@article{af2e89b405154d64909d88158bc6de1a,

title = "Underpotential deposition of Cu on Au(111) from neutral chloride containing electrolyte",

abstract = "The structure of a chloride terminated copper monolayer electrodeposited onto Au(111) from a CuSO4/KCl electrolyte was investigated ex situ by three complementary experimental techniques (scanning tunneling microscopy (STM), photoelectron spectroscopy (PES), X-ray standing wave (XSW) excitation) and density functional theory (DFT) calculations. STM at atomic resolution reveals a stable, highly ordered layer which exhibits a Moire structure and is described by a (5×5) unit cell. The XSW/PES data yield a well-defined position of the Cu layer and the value of 2.16 A above the topmost Au layer suggests that the atoms are adsorbed in threefold hollow sites. The chloride exhibits some distribution around a distance of 3.77 {\AA} in agreement with the observed Moire pattern due to a higher order commensurate lattice. This structure, a high order commensurate Cl overlayer on top of a commensurate (1×1) Cu layer with Cu at threefold hollow sites, is corroborated by the DFT calculations.",

author = "Hannah Aitchison and Nikolaus Meyerbroker and Tien-Lin Lee and J{\"o}rg Zegenhagen and Thomas Potter and Fr{\"u}chtl, {Herbert A.} and Izabela Cebula and Manfred Buck",

note = "Support by the Leverhulme Trust (RGP-2013-177) and EPSRC via a doctoral training grant (H.A.) is gratefully acknowledged.",

year = "2017",

month = sep,

day = "21",

doi = "10.1039/C7CP04244B",

language = "English",

volume = "19",

pages = "24146--24153",

journal = "Physical Chemistry Chemical Physics",

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TY - JOUR

T1 - Underpotential deposition of Cu on Au(111) from neutral chloride containing electrolyte

AU - Aitchison, Hannah

AU - Meyerbroker, Nikolaus

AU - Lee, Tien-Lin

AU - Zegenhagen, Jörg

AU - Potter, Thomas

AU - Früchtl, Herbert A.

AU - Cebula, Izabela

AU - Buck, Manfred

N1 - Support by the Leverhulme Trust (RGP-2013-177) and EPSRC via a doctoral training grant (H.A.) is gratefully acknowledged.

PY - 2017/9/21

Y1 - 2017/9/21

N2 - The structure of a chloride terminated copper monolayer electrodeposited onto Au(111) from a CuSO4/KCl electrolyte was investigated ex situ by three complementary experimental techniques (scanning tunneling microscopy (STM), photoelectron spectroscopy (PES), X-ray standing wave (XSW) excitation) and density functional theory (DFT) calculations. STM at atomic resolution reveals a stable, highly ordered layer which exhibits a Moire structure and is described by a (5×5) unit cell. The XSW/PES data yield a well-defined position of the Cu layer and the value of 2.16 A above the topmost Au layer suggests that the atoms are adsorbed in threefold hollow sites. The chloride exhibits some distribution around a distance of 3.77 Å in agreement with the observed Moire pattern due to a higher order commensurate lattice. This structure, a high order commensurate Cl overlayer on top of a commensurate (1×1) Cu layer with Cu at threefold hollow sites, is corroborated by the DFT calculations.

AB - The structure of a chloride terminated copper monolayer electrodeposited onto Au(111) from a CuSO4/KCl electrolyte was investigated ex situ by three complementary experimental techniques (scanning tunneling microscopy (STM), photoelectron spectroscopy (PES), X-ray standing wave (XSW) excitation) and density functional theory (DFT) calculations. STM at atomic resolution reveals a stable, highly ordered layer which exhibits a Moire structure and is described by a (5×5) unit cell. The XSW/PES data yield a well-defined position of the Cu layer and the value of 2.16 A above the topmost Au layer suggests that the atoms are adsorbed in threefold hollow sites. The chloride exhibits some distribution around a distance of 3.77 Å in agreement with the observed Moire pattern due to a higher order commensurate lattice. This structure, a high order commensurate Cl overlayer on top of a commensurate (1×1) Cu layer with Cu at threefold hollow sites, is corroborated by the DFT calculations.

U2 - 10.1039/C7CP04244B

DO - 10.1039/C7CP04244B

M3 - Article

SN - 1463-9076

VL - 19

SP - 24146

EP - 24153

JO - Physical Chemistry Chemical Physics

JF - Physical Chemistry Chemical Physics

IS - 35

ER -

Underpotential deposition of Cu on Au(111) from neutral chloride containing electrolyte

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Supramolecular: Supramolecular Self-Assemblies as Nanotemplates for Electrodeposition

Datasets

Data Underpinning - Underpotential Deposition of Cu on Au(111) from Neutral Chloride Containing Electrolyte (dataset)

Cite this