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Ultra-small mode volume polariton condensation via precision He+ implantation

  • Yannis C. Balas*
  • , Xiaoqing Zhou
  • , Evgeniia Cherotchenko
  • , Ivan Kuznetsov
  • , Sai Kiran Rajendran
  • , Giannis G. Paschos
  • , Artur V. Trifonov
  • , Anton Nalitov
  • , Hamid Ohadi
  • , Pavlos G. Savvidis*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

We present a novel method for generating potential landscapes in GaAs microcavities through focused Heimplantation. The ion beam imprints micron-scale patterns of non-radiative centers that deplete the exciton reservoir and form a loss-defined potential minimum. Under non-resonant pumping, the resulting traps have a lateral size ≤ 1.2 μm and a three-dimensional mode volume of only ≈ 0.6 μm3, small enough to support a single polariton condensate mode. The implantation process maintains strong coupling and provides lithographic (< 300 nm) resolution. These loss-engineered traps effectively overcome the micrometer-scale limitations of conventional microcavity patterning techniques, opening new avenues for device development and polariton research within the sub-μm regime.
Original languageEnglish
Pages (from-to)3617-3623
Number of pages7
JournalScience Bulletin
Volume71
Issue number14
DOIs
Publication statusPublished - 30 Jul 2026

Keywords

  • Ion implantation
  • Polaritonic condensates
  • Confinement
  • Focused ion beam
  • Microcavity

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