Top-Down fabrication of bulk-insulating topological insulator nanowires for quantum devices

Matthias Rößler, Dingxun Fan, Felix Münning, Henry F. Legg, Andrea Bliesener, Gertjan Lippertz, Anjana Uday, Roozbeh Yazdanpanah, Junya Feng, Alexey Taskin, Yoichi Ando*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

In a nanowire (NW) of a three-dimensional topological insulator (TI), the quantum confinement of topological surface states leads to a peculiar sub-band structure that is useful for generating Majorana bound states. Top-down fabrication of TINWs from a high-quality thin film would be a scalable technology with great design flexibility, but there has been no report on top-down-fabricated TINWs where the chemical potential can be tuned to the charge neutrality point (CNP). Here we present a top-down fabrication process for bulk-insulating TINWs etched from high-quality (Bi1–xSbx)2Te3 thin films without degradation. We show that the chemical potential can be gate-tuned to the CNP, and the resistance of the NW presents characteristic oscillations as functions of the gate voltage and the parallel magnetic field, manifesting the TI-sub-band physics. We further demonstrate the superconducting proximity effect in these TINWs, preparing the groundwork for future devices to investigate Majorana bound states.
Original languageEnglish
Pages (from-to)2846-2853
Number of pages8
JournalNano Letters
Volume23
Issue number7
Early online date28 Mar 2023
DOIs
Publication statusPublished - 12 Apr 2023

Keywords

  • Topological insulator
  • Nanowire
  • Aharonov-Bohm oscillations
  • Josephson junction
  • Shapiro steps

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