Tight focusing with a binary microaxicon

Victor V Kotlyar; S S Stafeev; Liam O'Faolain; V A Soifer

doi:10.1364/OL.36.003100

Tight focusing with a binary microaxicon

Victor V Kotlyar, S S Stafeev, Liam O'Faolain, V A Soifer

Research output: Contribution to journal › Article › peer-review

Abstract

Using a near-field scanning microscope (NT-MDT) with a 100nm aperture cantilever held 1 μm apart from a microaxicon of diameter 14 μm and period 800nm, we measure a focal spot resulting from the illumination by a linearly
polarized laser light of wavelength λ ¼ 532nm, with itsFWHMbeing equal to 0:58λ, and the depth of focus being 5:6λ. The rms deviation of the focal spot intensity from the calculated value is 6%. The focus intensity is five times larger than the maximal illumination beam intensity.

Original language	English
Pages (from-to)	3100-3102
Journal	Optics Letters
Volume	36
Issue number	16
DOIs	https://doi.org/10.1364/OL.36.003100
Publication status	Published - 15 Aug 2011

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10.1364/OL.36.003100

KotlyarOpticsLetters2011TightFocusing
© 2011 Optical Society of America
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Lasing of Erbium in Crystalline silicon: Lasing of Erbium in crystalline silicon Photonic Nanostructures - LECSIN
O'Faolain, L. (PI) & Krauss, T. F. (CoI)
EPSRC
25/02/10 → 24/02/13
Project: Standard

Cite this

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abstract = "Using a near-field scanning microscope (NT-MDT) with a 100nm aperture cantilever held 1 μm apart from a microaxicon of diameter 14 μm and period 800nm, we measure a focal spot resulting from the illumination by a linearlypolarized laser light of wavelength λ ¼ 532nm, with itsFWHMbeing equal to 0:58λ, and the depth of focus being 5:6λ. The rms deviation of the focal spot intensity from the calculated value is 6%. The focus intensity is five times larger than the maximal illumination beam intensity.",

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AB - Using a near-field scanning microscope (NT-MDT) with a 100nm aperture cantilever held 1 μm apart from a microaxicon of diameter 14 μm and period 800nm, we measure a focal spot resulting from the illumination by a linearlypolarized laser light of wavelength λ ¼ 532nm, with itsFWHMbeing equal to 0:58λ, and the depth of focus being 5:6λ. The rms deviation of the focal spot intensity from the calculated value is 6%. The focus intensity is five times larger than the maximal illumination beam intensity.

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Tight focusing with a binary microaxicon

Abstract

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Lasing of Erbium in Crystalline silicon: Lasing of Erbium in crystalline silicon Photonic Nanostructures - LECSIN

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