Test structures for the characterisation of conductive carbon produced from photoresist

S. Scarfi; S. Smith; A. Tabasnikov; I. Schmuser; E. Blair; A. S. Bunting; A. J. Walton; A. F. Murray; J. G. Terry

doi:10.1109/ICMTS.2016.7476204

Test structures for the characterisation of conductive carbon produced from photoresist

S. Scarfi, S. Smith, A. Tabasnikov, I. Schmuser, E. Blair, A. S. Bunting, A. J. Walton, A. F. Murray, J. G. Terry

School of Physics and Astronomy

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Conductive carbon films are highly attractive for use as electrodes in electrochemistry and biosensing applications. Patterned photoresist films can be transformed into carbon electrodes using standard photolithographic techniques followed by pyrolysation of the photoresist in a furnace under a reducing atmosphere. Previous studies have been made of the electrical properties of blanket carbon films created using this method of fabrication. However, there is a need to investigate pattern dependent effects, particularly the extent to which the dimensions of the patterned films shrink during the high temperature processing. This study applies microfabricated test structures to the process characterisation of conductive carbon produced from standard positive photoresists.

Original language	English
Title of host publication	2016 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 - Conference Proceedings
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	184-189
Number of pages	6
Volume	2016-May
ISBN (Electronic)	9781467387934
DOIs	https://doi.org/10.1109/ICMTS.2016.7476204
Publication status	Published - 20 May 2016
Event	29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 - Yokohama, Japan Duration: 28 Mar 2016 → 31 Mar 2016

Conference

Conference	29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016
Country/Territory	Japan
City	Yokohama
Period	28/03/16 → 31/03/16

Keywords

Biosensors
Carbon
Electrochemistry
Microelectronic test structures
Microsystems

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10.1109/ICMTS.2016.7476204

Cite this

Scarfi, S., Smith, S., Tabasnikov, A., Schmuser, I., Blair, E., Bunting, A. S., Walton, A. J., Murray, A. F., & Terry, J. G. (2016). Test structures for the characterisation of conductive carbon produced from photoresist. In 2016 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 - Conference Proceedings (Vol. 2016-May, pp. 184-189). Article 7476204 Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICMTS.2016.7476204

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title = "Test structures for the characterisation of conductive carbon produced from photoresist",

abstract = "Conductive carbon films are highly attractive for use as electrodes in electrochemistry and biosensing applications. Patterned photoresist films can be transformed into carbon electrodes using standard photolithographic techniques followed by pyrolysation of the photoresist in a furnace under a reducing atmosphere. Previous studies have been made of the electrical properties of blanket carbon films created using this method of fabrication. However, there is a need to investigate pattern dependent effects, particularly the extent to which the dimensions of the patterned films shrink during the high temperature processing. This study applies microfabricated test structures to the process characterisation of conductive carbon produced from standard positive photoresists.",

keywords = "Biosensors, Carbon, Electrochemistry, Microelectronic test structures, Microsystems",

author = "S. Scarfi and S. Smith and A. Tabasnikov and I. Schmuser and E. Blair and Bunting, {A. S.} and Walton, {A. J.} and Murray, {A. F.} and Terry, {J. G.}",

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doi = "10.1109/ICMTS.2016.7476204",

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address = "United States",

note = "29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 ; Conference date: 28-03-2016 Through 31-03-2016",

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Scarfi, S, Smith, S, Tabasnikov, A, Schmuser, I, Blair, E, Bunting, AS, Walton, AJ, Murray, AF & Terry, JG 2016, Test structures for the characterisation of conductive carbon produced from photoresist. in 2016 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 - Conference Proceedings. vol. 2016-May, 7476204, Institute of Electrical and Electronics Engineers Inc., pp. 184-189, 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016, Yokohama, Japan, 28/03/16. https://doi.org/10.1109/ICMTS.2016.7476204

Test structures for the characterisation of conductive carbon produced from photoresist. / Scarfi, S.; Smith, S.; Tabasnikov, A. et al.
2016 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 - Conference Proceedings. Vol. 2016-May Institute of Electrical and Electronics Engineers Inc., 2016. p. 184-189 7476204.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Test structures for the characterisation of conductive carbon produced from photoresist

AU - Scarfi, S.

AU - Smith, S.

AU - Tabasnikov, A.

AU - Schmuser, I.

AU - Blair, E.

AU - Bunting, A. S.

AU - Walton, A. J.

AU - Murray, A. F.

AU - Terry, J. G.

PY - 2016/5/20

Y1 - 2016/5/20

N2 - Conductive carbon films are highly attractive for use as electrodes in electrochemistry and biosensing applications. Patterned photoresist films can be transformed into carbon electrodes using standard photolithographic techniques followed by pyrolysation of the photoresist in a furnace under a reducing atmosphere. Previous studies have been made of the electrical properties of blanket carbon films created using this method of fabrication. However, there is a need to investigate pattern dependent effects, particularly the extent to which the dimensions of the patterned films shrink during the high temperature processing. This study applies microfabricated test structures to the process characterisation of conductive carbon produced from standard positive photoresists.

AB - Conductive carbon films are highly attractive for use as electrodes in electrochemistry and biosensing applications. Patterned photoresist films can be transformed into carbon electrodes using standard photolithographic techniques followed by pyrolysation of the photoresist in a furnace under a reducing atmosphere. Previous studies have been made of the electrical properties of blanket carbon films created using this method of fabrication. However, there is a need to investigate pattern dependent effects, particularly the extent to which the dimensions of the patterned films shrink during the high temperature processing. This study applies microfabricated test structures to the process characterisation of conductive carbon produced from standard positive photoresists.

KW - Biosensors

KW - Carbon

KW - Electrochemistry

KW - Microelectronic test structures

KW - Microsystems

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DO - 10.1109/ICMTS.2016.7476204

M3 - Conference contribution

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VL - 2016-May

SP - 184

EP - 189

BT - 2016 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 - Conference Proceedings

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016

Y2 - 28 March 2016 through 31 March 2016

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Scarfi S, Smith S, Tabasnikov A, Schmuser I, Blair E, Bunting AS et al. Test structures for the characterisation of conductive carbon produced from photoresist. In 2016 29th IEEE International Conference on Microelectronic Test Structures, ICMTS 2016 - Conference Proceedings. Vol. 2016-May. Institute of Electrical and Electronics Engineers Inc. 2016. p. 184-189. 7476204 doi: 10.1109/ICMTS.2016.7476204

Test structures for the characterisation of conductive carbon produced from photoresist

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Keywords

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