Submicron three-dimensional trenched electrodes and capacitors for DRAMs and FRAMs: Fabrication and electrical testing

We report conformal deposition of both RuO2 electrodes and PbZrxTi1-xO3 (PZT) capacitors in submicron Si trenches through the same in situ liquid source mist processing. The step coverage for the RuO2 electrodes is 75% at 225 degrees C. After electroding, we deposited Pb(Zr,Ti)O-3 thin films and nanotubes using the same apparatus with remanent polarization of similar to 15 mu C/cm(2). The step coverage was 59% on the sidewall and 79% on the bottom wall. Electrical testing showed charge storage (capacitance/trench) was 13 +/- 2 pF, with a breakdown voltage of 11.3 +/- 0.2 V and dielectric constant epsilon = 166 +/- 30. This shows that a single inexpensive processing can produce fully electroded dynamic random access memory trenched capacitors with high aspect ratios and commercial electrical performance. (c) 2008 American Institute of Physics. [DOI: 10.1063/1.2981197]