Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography

David J. Beesley, James Semple, Lethy Krishnan Jagadamma, Aram Amassian, Martyn A. McLachlan, Thomas D. Anthopoulos, John C. Demello*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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