Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

Guy Luke Whitworth; Shuyu Zhang; James Robert Young Stevenson; Bernd Ebenhoch; Ifor David William Samuel; Graham A. Turnbull

doi:10.1063/1.4933316

Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

Guy Luke Whitworth, Shuyu Zhang, James Robert Young Stevenson, Bernd Ebenhoch, Ifor David William Samuel, Graham A. Turnbull

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16 Citations (Scopus)

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Abstract

Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated polymer films. The technique was used to create light-emitting diffractive optical elements and organic semiconductor lasers. Gratings with lateral features as small as 70 nm and depths of ∼25 nm were achieved in poly(9,9-dioctylfluorenyl-2,7-diyl). The angular emission from the patterned films was studied, comparing measurement to theoretical predictions. Organic distributed feedback lasers fabricated with SIIL exhibited thresholds for lasing of ∼40 kW/cm², similar to those made with established nanoimprint processes. The results show that SIIL is a quick, convenient and practical technique for nanopatterning of polymer photonic devices.

Original language	English
Article number	163301
Journal	Applied Physics Letters
Volume	107
Issue number	16
DOIs	https://doi.org/10.1063/1.4933316
Publication status	Published - 19 Oct 2015

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10.1063/1.4933316

Whitworth_2015_APL_Solvent
© 2015 AIP Publishing LLC. This work is made available online in accordance with the publisher’s policies. This is the final published version of the work, which was originally published at: http://dx.doi.org/10.1063/1.4933316
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Ultra-parallel visable light communicati: UK Visible Light Communications
Samuel, I. D. W. (PI) & Turnbull, G. (CoI)
EPSRC
1/10/12 → 28/02/17
Project: Standard
Challening the Limits of Photonics: stru: Challenging the Limits of Photonics: Structured Light
Dholakia, K. (PI), Krauss, T. F. (CoI) & Samuel, I. D. W. (CoI)
EPSRC
1/06/12 → 31/05/17
Project: Standard

Cite this

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title = "Solvent immersion nanoimprint lithography of fluorescent conjugated polymers",

abstract = "Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated polymer films. The technique was used to create light-emitting diffractive optical elements and organic semiconductor lasers. Gratings with lateral features as small as 70 nm and depths of ∼25 nm were achieved in poly(9,9-dioctylfluorenyl-2,7-diyl). The angular emission from the patterned films was studied, comparing measurement to theoretical predictions. Organic distributed feedback lasers fabricated with SIIL exhibited thresholds for lasing of ∼40 kW/cm2, similar to those made with established nanoimprint processes. The results show that SIIL is a quick, convenient and practical technique for nanopatterning of polymer photonic devices.",

author = "Whitworth, {Guy Luke} and Shuyu Zhang and Stevenson, {James Robert Young} and Bernd Ebenhoch and Samuel, {Ifor David William} and Turnbull, {Graham A.}",

note = "This work was supported by Engineering and Physical Sciences Research Council (EPSRC) Programme Grants: (EP1J01771X), (EP/K00042X), (EP/J5005491), and (EP/K503162). ",

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doi = "10.1063/1.4933316",

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T1 - Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

AU - Whitworth, Guy Luke

AU - Zhang, Shuyu

AU - Stevenson, James Robert Young

AU - Ebenhoch, Bernd

AU - Samuel, Ifor David William

AU - Turnbull, Graham A.

N1 - This work was supported by Engineering and Physical Sciences Research Council (EPSRC) Programme Grants: (EP1J01771X), (EP/K00042X), (EP/J5005491), and (EP/K503162).

PY - 2015/10/19

Y1 - 2015/10/19

N2 - Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated polymer films. The technique was used to create light-emitting diffractive optical elements and organic semiconductor lasers. Gratings with lateral features as small as 70 nm and depths of ∼25 nm were achieved in poly(9,9-dioctylfluorenyl-2,7-diyl). The angular emission from the patterned films was studied, comparing measurement to theoretical predictions. Organic distributed feedback lasers fabricated with SIIL exhibited thresholds for lasing of ∼40 kW/cm2, similar to those made with established nanoimprint processes. The results show that SIIL is a quick, convenient and practical technique for nanopatterning of polymer photonic devices.

AB - Solvent immersion imprint lithography (SIIL) was used to directly nanostructure conjugated polymer films. The technique was used to create light-emitting diffractive optical elements and organic semiconductor lasers. Gratings with lateral features as small as 70 nm and depths of ∼25 nm were achieved in poly(9,9-dioctylfluorenyl-2,7-diyl). The angular emission from the patterned films was studied, comparing measurement to theoretical predictions. Organic distributed feedback lasers fabricated with SIIL exhibited thresholds for lasing of ∼40 kW/cm2, similar to those made with established nanoimprint processes. The results show that SIIL is a quick, convenient and practical technique for nanopatterning of polymer photonic devices.

U2 - 10.1063/1.4933316

DO - 10.1063/1.4933316

M3 - Article

AN - SCOPUS:84945151255

SN - 0003-6951

VL - 107

JO - Applied Physics Letters

JF - Applied Physics Letters

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Solvent immersion nanoimprint lithography of fluorescent conjugated polymers

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Ultra-parallel visable light communicati: UK Visible Light Communications

Challening the Limits of Photonics: stru: Challenging the Limits of Photonics: Structured Light

Cite this