Abstract
In this paper, we apply the technique of shot shifting to photonic wires and photonic crystals. We show that is may significantly reduce the discontinuities introduced by stitching dramatically improving the device quality. (c) 2007 Elsevier B.V. All rights reserved.
Original language | English |
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Pages (from-to) | 1463-1466 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 84 |
DOIs | |
Publication status | Published - May 2007 |
Keywords
- nanophotonics
- electron beam lithography
- shot shift
- stitching error
- photonic crystal
- photonic wire
- CRYSTAL WAVE-GUIDES
- PHOTONIC CRYSTAL