Replicative generation of metal microstructures by template-directed electrometallization

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Abstract

Copper structures were produced by electrochemical deposition onto patterned self-assembled monolayers (SAMS) of thiols adsorbed on polycrystalline gold substrates and subsequent transfer to an insulating substrate. Selective metal deposition was achieved by use of thiols which differ in their electrochemical blocking properties, namely hexadecane thiol [CH3(CH2)(15)SH] and omega-(4(')-methyl-biphenyl-4-yl)-methanethiol (CH3-C6H4-C6H4-CH2-SH). Besides control of the blocking properties, the SAM served to minimize adhesion between the metal deposit and the substrate, thus, allowing the transfer of the metal pattern. Since the process is replicative, it represents a very simple and fast route to generating metal patterns. (c) 2005 American Institute of Physics.

Original languageEnglish
Pages (from-to)024101
Number of pages3
JournalApplied Physics Letters
Volume87
Issue number2
DOIs
Publication statusPublished - 11 Jul 2005

Keywords

  • SELF-ASSEMBLED MONOLAYERS
  • BIPHENYL-BASED THIOLS
  • ELECTRODEPOSITION
  • LITHOGRAPHY
  • ELECTROCHEMISTRY
  • FABRICATION
  • SUBSTRATE
  • PATTERN
  • GOLD

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