Abstract
The sticking probability of Zn on amorphous GeS2 is greatly reduced when the UHV-prepared semiconductor film is photo-oxidized in the presence of band-gap radiation. The phenomena underlying this interesting effect have been elucidated in a kinetic and structural study using electron spectroscopy and x-ray-absorption spectroscopy. Selective photo-oxidation of Ge sites strongly suppresses the formation of Ge-Zn bonds at the interface: these act as nucleation sites for the growing metal film. A consistent picture emerges that also accounts for the very different behavior encountered during deposition of Ag films with and without photo-oxidation in the closely related Ag/GeS2 system.
| Original language | English |
|---|---|
| Pages (from-to) | 2054-2062 |
| Number of pages | 9 |
| Journal | Physical Review B |
| Volume | 52 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 1 Jan 1995 |
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