Quantum Point Contact Microscopy

Yong-hui Zhang, Peter Wahl, Klaus Kern

Research output: Contribution to journalArticlepeer-review

Abstract

We introduce quantum point contact microscopy (QPCM) as a novel method for surface characterization, where the conductance through a quantum point contact formed by a metal atom between the tip of a scanning tunneling microscope and the surface is mapped across the surface. Application of QPCM to copper and gold (111) shows reproducibly atomic resolution, on gold (111) the alternating atomic stacking of the surface reconstruction is observed in real space. The perspectives for chemical sensitivity in QPCM images are demonstrated for an iron platinum surface alloy where we observe local variations of the transport current due to changes in the chemical environment of the point contact.

Original languageEnglish
Pages (from-to)3838-3843
Number of pages6
JournalNano Letters
Volume11
Issue number9
DOIs
Publication statusPublished - Sept 2011

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