Pulsed laser deposition and characterization of Bi4-xNdxTi3O12 thin films

Engineering

• Thin Films 100%
• Crystallographic Orientation 100%
• Pulsed Laser 100%
• Ray Diffraction 50%
• Dopants 50%
• Pulsed Laser Ablation 50%
• Epitaxial Film 50%
• Film Property 50%
• Film Orientation 50%
• Titanate 50%
• Random Access Memory 50%

Material Science

• Pulsed Laser Deposition 100%
• Film 100%
• Thin Films 100%
• Ferroelectric Material 40%
• Ferroelectricity 40%
• Strontium 20%
• Epitaxial Film 20%
• Laser Ablation 20%
• Doping (Additives) 20%
• Titanate 20%
• X-Ray Diffraction 20%