Abstract
The performance of GaN-based surface-emitting lasers may be greatly improved by the use of highly-reflecting SiO2/ZrO2 multilayers for both cavity mirrors. We consider some of the limitations of GaN/Al(Ga)N multilayer mirrors and discuss alternative routes for incorporating dielectric multilayers within InGaN/GaN quantum well surface-emitting devices, using lateral epitaxial overgrowth. The use of lateral overgrowth techniques promise the benefit of reduced dislocation densities within the active region. The use of single layer lift-off techniques for the fabrication of patterned mirror templates suitable for overgrowth on GaN-on-sapphire is described. (C) 2001 Elsevier Science B.V. All rights reserved.
Original language | English |
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Volume | 82 |
Publication status | Published - 22 May 2001 |
Keywords
- nitride semiconductors
- VCSELs
- microcavities
- oxide mirrors
- SURFACE-EMITTING LASER
- EMISSION