Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride

X Wang; T N Hooper; Amit Kumar; Isobel Priest; Y Sheng; T O M Samuels; S Wang; A W Robertson; M. Pacios; H Bhaskaran; A S Weller

doi:10.1039/C6CE02006B

Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride

X Wang, T N Hooper, Amit Kumar, Isobel Priest, Y Sheng, T O M Samuels, S Wang, A W Robertson, M. Pacios, H Bhaskaran, A S Weller

School of Chemistry

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	285-294
Journal	CrystEngComm
Volume	19
Issue number	2
Early online date	8 Dec 2016
DOIs	https://doi.org/10.1039/C6CE02006B
Publication status	Published - 2017

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10.1039/C6CE02006BLicence: CC BY

Cite this

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title = "Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride",

author = "X Wang and Hooper, {T N} and Amit Kumar and Isobel Priest and Y Sheng and Samuels, {T O M} and S Wang and Robertson, {A W} and M. Pacios and H Bhaskaran and Weller, {A S}",

year = "2017",

doi = "10.1039/C6CE02006B",

language = "English",

volume = "19",

pages = "285--294",

journal = "CrystEngComm",

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publisher = "Royal Society of Chemistry",

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T1 - Oligomeric aminoborane precursors for the chemical vapour deposition growth of few-layer hexagonal boron nitride

AU - Wang, X

AU - Hooper, T N

AU - Kumar, Amit

AU - Priest, Isobel

AU - Sheng, Y

AU - Samuels, T O M

AU - Wang, S

AU - Robertson, A W

AU - Pacios, M.

AU - Bhaskaran, H

AU - Weller, A S

PY - 2017

Y1 - 2017

U2 - 10.1039/C6CE02006B

DO - 10.1039/C6CE02006B

M3 - Article

SN - 1466-8033

VL - 19

SP - 285

EP - 294

JO - CrystEngComm

JF - CrystEngComm

IS - 2

ER -