Misted deposition of [3D] trenches for drams and frams - III. PZT thin films and PZT nanotubes

M. Miyake; J. F. Scott; X. -J. Lou; F. D. Morrison; S. Motoyama; T. Tatsuta; O. Tsuji

Misted deposition of [3D] trenches for drams and frams - III. PZT thin films and PZT nanotubes

M. Miyake, J. F. Scott, X. -J. Lou, F. D. Morrison, S. Motoyama, T. Tatsuta, O. Tsuji

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Pb(Zr,Ti)O-3 (PZT) thin films and nanotube were prepared on SiO2/Si substrates by liquid source misted chemical deposition (LSMCD) using Samco MD-6060 apparatus. We report the deposition and characterization of transparent ferroelectric thin films and nanotubes. PZT thin films deposited at ambient conditions and annealing at 700 degrees C exhibit good ferroelectric properties with remanent polarisation of ca. 15 mu C/Cm-2. The step coverage was 59% on the side wall and 79% on the bottom wall.

Original language	English
Title of host publication	2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2
Place of Publication	NEW YORK
Publisher	IEEE
Pages	38-40
Number of pages	3
ISBN (Print)	978-1-4244-1333-1
Publication status	Published - 2007
Event	16th IEEE International Symposium on Applications of Ferroelectrics - Nara Duration: 27 May 2007 → 31 May 2007

Conference

Conference	16th IEEE International Symposium on Applications of Ferroelectrics
City	Nara
Period	27/05/07 → 31/05/07

Keywords

CHEMICAL-VAPOR-DEPOSITION
FABRICATION

Royal Society Fellowship 516002.K5799/je: Royal Society Fellowship 516002.K5799/je
Morrison, F. (PI)
The Royal Society
1/08/06 → 30/09/09
Project: Fellowship

Cite this

@inproceedings{2ae443f9e591492798e10068fdbaefbc,

title = "Misted deposition of [3D] trenches for drams and frams - III. PZT thin films and PZT nanotubes",

abstract = "Pb(Zr,Ti)O-3 (PZT) thin films and nanotube were prepared on SiO2/Si substrates by liquid source misted chemical deposition (LSMCD) using Samco MD-6060 apparatus. We report the deposition and characterization of transparent ferroelectric thin films and nanotubes. PZT thin films deposited at ambient conditions and annealing at 700 degrees C exhibit good ferroelectric properties with remanent polarisation of ca. 15 mu C/Cm-2. The step coverage was 59% on the side wall and 79% on the bottom wall.",

keywords = "CHEMICAL-VAPOR-DEPOSITION, FABRICATION",

author = "M. Miyake and Scott, {J. F.} and Lou, {X. -J.} and Morrison, {F. D.} and S. Motoyama and T. Tatsuta and O. Tsuji",

year = "2007",

language = "English",

isbn = "978-1-4244-1333-1",

pages = "38--40",

booktitle = "2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2",

publisher = "IEEE",

note = "16th IEEE International Symposium on Applications of Ferroelectrics ; Conference date: 27-05-2007 Through 31-05-2007",

}

Miyake, M, Scott, JF, Lou, X-J, Morrison, FD, Motoyama, S, Tatsuta, T & Tsuji, O 2007, Misted deposition of [3D] trenches for drams and frams - III. PZT thin films and PZT nanotubes. in 2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2. IEEE, NEW YORK, pp. 38-40, 16th IEEE International Symposium on Applications of Ferroelectrics, Nara, 27/05/07.

TY - GEN

T1 - Misted deposition of [3D] trenches for drams and frams - III. PZT thin films and PZT nanotubes

AU - Miyake, M.

AU - Scott, J. F.

AU - Lou, X. -J.

AU - Morrison, F. D.

AU - Motoyama, S.

AU - Tatsuta, T.

AU - Tsuji, O.

PY - 2007

Y1 - 2007

N2 - Pb(Zr,Ti)O-3 (PZT) thin films and nanotube were prepared on SiO2/Si substrates by liquid source misted chemical deposition (LSMCD) using Samco MD-6060 apparatus. We report the deposition and characterization of transparent ferroelectric thin films and nanotubes. PZT thin films deposited at ambient conditions and annealing at 700 degrees C exhibit good ferroelectric properties with remanent polarisation of ca. 15 mu C/Cm-2. The step coverage was 59% on the side wall and 79% on the bottom wall.

AB - Pb(Zr,Ti)O-3 (PZT) thin films and nanotube were prepared on SiO2/Si substrates by liquid source misted chemical deposition (LSMCD) using Samco MD-6060 apparatus. We report the deposition and characterization of transparent ferroelectric thin films and nanotubes. PZT thin films deposited at ambient conditions and annealing at 700 degrees C exhibit good ferroelectric properties with remanent polarisation of ca. 15 mu C/Cm-2. The step coverage was 59% on the side wall and 79% on the bottom wall.

KW - CHEMICAL-VAPOR-DEPOSITION

KW - FABRICATION

M3 - Conference contribution

SN - 978-1-4244-1333-1

SP - 38

EP - 40

BT - 2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2

PB - IEEE

CY - NEW YORK

T2 - 16th IEEE International Symposium on Applications of Ferroelectrics

Y2 - 27 May 2007 through 31 May 2007

ER -

Misted deposition of [3D] trenches for drams and frams - III. PZT thin films and PZT nanotubes

Abstract

Conference

Keywords

Fingerprint

Projects

Royal Society Fellowship 516002.K5799/je: Royal Society Fellowship 516002.K5799/je

Cite this