Misted deposition of [3D] trenches for drams and frams - III. PZT thin films and PZT nanotubes

M. Miyake, J. F. Scott, X. -J. Lou, F. D. Morrison, S. Motoyama, T. Tatsuta, O. Tsuji

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Pb(Zr,Ti)O-3 (PZT) thin films and nanotube were prepared on SiO2/Si substrates by liquid source misted chemical deposition (LSMCD) using Samco MD-6060 apparatus. We report the deposition and characterization of transparent ferroelectric thin films and nanotubes. PZT thin films deposited at ambient conditions and annealing at 700 degrees C exhibit good ferroelectric properties with remanent polarisation of ca. 15 mu C/Cm-2. The step coverage was 59% on the side wall and 79% on the bottom wall.

Original languageEnglish
Title of host publication2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2
Place of PublicationNEW YORK
PublisherIEEE
Pages38-40
Number of pages3
ISBN (Print)978-1-4244-1333-1
Publication statusPublished - 2007
Event16th IEEE International Symposium on Applications of Ferroelectrics - Nara
Duration: 27 May 200731 May 2007

Conference

Conference16th IEEE International Symposium on Applications of Ferroelectrics
CityNara
Period27/05/0731/05/07

Keywords

  • CHEMICAL-VAPOR-DEPOSITION
  • FABRICATION

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