Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation

Mohammed Zubair Mohammed Shamim; Saydulla Persheyev; Monji Zaidi; Mohammed Usman; Mohammad Shiblee; Syed Jaffar Ali; Mohammad Rizwanur Rahman

doi:10.1080/10584587.2019.1674988

Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation

Mohammed Zubair Mohammed Shamim^*, Saydulla Persheyev, Monji Zaidi, Mohammed Usman, Mohammad Shiblee, Syed Jaffar Ali, Mohammad Rizwanur Rahman

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

Self-aligned silicon micro-nano structured electron field emitter arrays were fabricated using pulsed krypton fluoride (KrF) excimer laser crystallization (ELC) of hydrogenated amorphous thin silicon films (a-Si:H) on metal coated backplane samples. We investigate the effect of laser processing parameters on the growth of micro-nano conical structures on the surface of the thin silicon films. Randomly oriented conical structures as high as 1 µm were fabricated using laser pulse frequency of 100 Hz and sample stage scanning speed of 0.25 mm/sec. Best field emission (FE) results were measured from samples with the highest surface features with FE currents in the order of 10⁻⁶ A and low turn-on emission threshold of ∼14 V/µm. Light emission from the prototype demonstrators was tested using bespoke driver electronics and planar anodes coated with indium tin-oxide (ITO) and medium voltage FE phosphors, to exemplify their usage for future flat panel display technologies.

Original language	English
Pages (from-to)	47-57
Number of pages	11
Journal	Integrated Ferroelectrics
Volume	204
Issue number	1
Early online date	24 Jan 2020
DOIs	https://doi.org/10.1080/10584587.2019.1674988
Publication status	Published - 2020
Event	International Conference on Nano-Structured Materials & Devices - ICNSMD 2018 - New Delhi, India Duration: 1 Oct 2018 → 5 Oct 2018

Keywords

Electron field emission display
Excimer laser crystallization
Hydrogenated amorphous silicon

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10.1080/10584587.2019.1674988

Shamim_2020_Micronanofabrication_AAM
Copyright © 2020 Taylor & Francis Group, LLC. This work has been made available online in accordance with publisher policies or with permission. Permission for further reuse of this content should be sought from the publisher or the rights holder. This is the author created accepted manuscript following peer review and may differ slightly from the final published version. The final published version of this work is available at https://doi.org/10.1080/10584587.2019.1674988.
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title = "Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation",

abstract = "Self-aligned silicon micro-nano structured electron field emitter arrays were fabricated using pulsed krypton fluoride (KrF) excimer laser crystallization (ELC) of hydrogenated amorphous thin silicon films (a-Si:H) on metal coated backplane samples. We investigate the effect of laser processing parameters on the growth of micro-nano conical structures on the surface of the thin silicon films. Randomly oriented conical structures as high as 1 µm were fabricated using laser pulse frequency of 100 Hz and sample stage scanning speed of 0.25 mm/sec. Best field emission (FE) results were measured from samples with the highest surface features with FE currents in the order of 10−6 A and low turn-on emission threshold of ∼14 V/µm. Light emission from the prototype demonstrators was tested using bespoke driver electronics and planar anodes coated with indium tin-oxide (ITO) and medium voltage FE phosphors, to exemplify their usage for future flat panel display technologies.",

keywords = "Electron field emission display, Excimer laser crystallization, Hydrogenated amorphous silicon",

author = "Shamim, \{Mohammed Zubair Mohammed\} and Saydulla Persheyev and Monji Zaidi and Mohammed Usman and Mohammad Shiblee and Ali, \{Syed Jaffar\} and Rahman, \{Mohammad Rizwanur\}",

note = "The authors gratefully acknowledge the support by the College of Engineering Research Center under the Deanship of Scientific Research of King Khalid University, Saudi Arabia. (Grant No. 98); International Conference on Nano-Structured Materials \& Devices - ICNSMD 2018, ICNSMD 2018 ; Conference date: 01-10-2018 Through 05-10-2018",

year = "2020",

doi = "10.1080/10584587.2019.1674988",

language = "English",

volume = "204",

pages = "47--57",

journal = "Integrated Ferroelectrics",

issn = "1058-4587",

publisher = "Taylor and Francis",

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T1 - Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation

AU - Shamim, Mohammed Zubair Mohammed

AU - Persheyev, Saydulla

AU - Zaidi, Monji

AU - Usman, Mohammed

AU - Shiblee, Mohammad

AU - Ali, Syed Jaffar

AU - Rahman, Mohammad Rizwanur

N1 - The authors gratefully acknowledge the support by the College of Engineering Research Center under the Deanship of Scientific Research of King Khalid University, Saudi Arabia. (Grant No. 98)

PY - 2020

Y1 - 2020

N2 - Self-aligned silicon micro-nano structured electron field emitter arrays were fabricated using pulsed krypton fluoride (KrF) excimer laser crystallization (ELC) of hydrogenated amorphous thin silicon films (a-Si:H) on metal coated backplane samples. We investigate the effect of laser processing parameters on the growth of micro-nano conical structures on the surface of the thin silicon films. Randomly oriented conical structures as high as 1 µm were fabricated using laser pulse frequency of 100 Hz and sample stage scanning speed of 0.25 mm/sec. Best field emission (FE) results were measured from samples with the highest surface features with FE currents in the order of 10−6 A and low turn-on emission threshold of ∼14 V/µm. Light emission from the prototype demonstrators was tested using bespoke driver electronics and planar anodes coated with indium tin-oxide (ITO) and medium voltage FE phosphors, to exemplify their usage for future flat panel display technologies.

AB - Self-aligned silicon micro-nano structured electron field emitter arrays were fabricated using pulsed krypton fluoride (KrF) excimer laser crystallization (ELC) of hydrogenated amorphous thin silicon films (a-Si:H) on metal coated backplane samples. We investigate the effect of laser processing parameters on the growth of micro-nano conical structures on the surface of the thin silicon films. Randomly oriented conical structures as high as 1 µm were fabricated using laser pulse frequency of 100 Hz and sample stage scanning speed of 0.25 mm/sec. Best field emission (FE) results were measured from samples with the highest surface features with FE currents in the order of 10−6 A and low turn-on emission threshold of ∼14 V/µm. Light emission from the prototype demonstrators was tested using bespoke driver electronics and planar anodes coated with indium tin-oxide (ITO) and medium voltage FE phosphors, to exemplify their usage for future flat panel display technologies.

KW - Electron field emission display

KW - Excimer laser crystallization

KW - Hydrogenated amorphous silicon

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DO - 10.1080/10584587.2019.1674988

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VL - 204

SP - 47

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JO - Integrated Ferroelectrics

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IS - 1

T2 - International Conference on Nano-Structured Materials & Devices - ICNSMD 2018

Y2 - 1 October 2018 through 5 October 2018

ER -

Micro-nano fabrication of self-aligned silicon electron field emitter arrays using pulsed KrF laser irradiation

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