Magnetic characteristics of Fe4N epitaxial films grown by halide vapor phase deposition under atmospheric pressure

T  Takahashi; N  Takahashi; T  Nakamura; T  Kato; K  Furukawa; G M  Smith; P C  Riedi

doi:10.1016/j.solidstatesciences.2003.11.004

Magnetic characteristics of Fe4N epitaxial films grown by halide vapor phase deposition under atmospheric pressure

T Takahashi, N Takahashi, T Nakamura, T Kato, K Furukawa, G M Smith, P C Riedi

School of Physics and Astronomy

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

The thin films of Fe4N which were prepared by atmospheric pressure halide vapor phase deposition, were epitaxially grown on a MgO(100) substrate and have cubic structure with good crystallinity. The magnetic characteristics of Fe4N epitaxial film show soft magnetic behavior under various temperatures and various external magnetic field directions. As the temperature is decreased, the saturation magnetization increases. Also, the magnetized behavior is observed when the magnetic field is applied parallel to the film plane. It was found that the magnetic moments of Fe4N epitaxial film are facing parallel to the film plane. (C) 2003 Elsevier SAS. All rights reserved.

Original language	English
Pages (from-to)	97-99
Number of pages	3
Journal	Solid State Sciences
Volume	6
DOIs	https://doi.org/10.1016/j.solidstatesciences.2003.11.004
Publication status	Published - Jan 2004

Keywords

Fe4N
AP-HVPE
epitaxial growth
thin film
magnetic materials
SQUID
FEN THIN-FILMS
CHLORIDE SOURCE

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10.1016/j.solidstatesciences.2003.11.004

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title = "Magnetic characteristics of Fe4N epitaxial films grown by halide vapor phase deposition under atmospheric pressure",

abstract = "The thin films of Fe4N which were prepared by atmospheric pressure halide vapor phase deposition, were epitaxially grown on a MgO(100) substrate and have cubic structure with good crystallinity. The magnetic characteristics of Fe4N epitaxial film show soft magnetic behavior under various temperatures and various external magnetic field directions. As the temperature is decreased, the saturation magnetization increases. Also, the magnetized behavior is observed when the magnetic field is applied parallel to the film plane. It was found that the magnetic moments of Fe4N epitaxial film are facing parallel to the film plane. (C) 2003 Elsevier SAS. All rights reserved.",

keywords = "Fe4N, AP-HVPE, epitaxial growth, thin film, magnetic materials, SQUID, FEN THIN-FILMS, CHLORIDE SOURCE",

author = "T Takahashi and N Takahashi and T Nakamura and T Kato and K Furukawa and Smith, {G M} and Riedi, {P C}",

year = "2004",

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T1 - Magnetic characteristics of Fe4N epitaxial films grown by halide vapor phase deposition under atmospheric pressure

AU - Takahashi, T

AU - Takahashi, N

AU - Nakamura, T

AU - Kato, T

AU - Furukawa, K

AU - Smith, G M

AU - Riedi, P C

PY - 2004/1

Y1 - 2004/1

N2 - The thin films of Fe4N which were prepared by atmospheric pressure halide vapor phase deposition, were epitaxially grown on a MgO(100) substrate and have cubic structure with good crystallinity. The magnetic characteristics of Fe4N epitaxial film show soft magnetic behavior under various temperatures and various external magnetic field directions. As the temperature is decreased, the saturation magnetization increases. Also, the magnetized behavior is observed when the magnetic field is applied parallel to the film plane. It was found that the magnetic moments of Fe4N epitaxial film are facing parallel to the film plane. (C) 2003 Elsevier SAS. All rights reserved.

AB - The thin films of Fe4N which were prepared by atmospheric pressure halide vapor phase deposition, were epitaxially grown on a MgO(100) substrate and have cubic structure with good crystallinity. The magnetic characteristics of Fe4N epitaxial film show soft magnetic behavior under various temperatures and various external magnetic field directions. As the temperature is decreased, the saturation magnetization increases. Also, the magnetized behavior is observed when the magnetic field is applied parallel to the film plane. It was found that the magnetic moments of Fe4N epitaxial film are facing parallel to the film plane. (C) 2003 Elsevier SAS. All rights reserved.

KW - Fe4N

KW - AP-HVPE

KW - epitaxial growth

KW - thin film

KW - magnetic materials

KW - SQUID

KW - FEN THIN-FILMS

KW - CHLORIDE SOURCE

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U2 - 10.1016/j.solidstatesciences.2003.11.004

DO - 10.1016/j.solidstatesciences.2003.11.004

M3 - Article

SN - 1293-2558

VL - 6

SP - 97

EP - 99

JO - Solid State Sciences

JF - Solid State Sciences

ER -

Magnetic characteristics of Fe4N epitaxial films grown by halide vapor phase deposition under atmospheric pressure

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Keywords

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