Locally erasable couplers for optical device testing in silicon on insulator

R. Topley*, G. Martinez-Jimenez, L. O'Faolain, N. Healy, S. Mailis, D. J. Thomson, F. Y. Gardes, A. C. Peacock, D. N. R. Payne, G. Z. Mashanovich, G. T. Reed

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

29 Citations (Scopus)

Abstract

Wafer scale testing is critical to reducing production costs and increasing production yield. Here we report a method that allows testing of individual optical components within a complex optical integrated circuit. The method is based on diffractive grating couplers, fabricated using lattice damage induced by ion implantation of germanium. These gratings can be erased via localised laser annealing, which is shown to reduce the outcoupling efficiency by over 20 dB after the device testing is completed. Laser annealing was achieved by employing a CW laser, operating at visible wavelengths thus reducing equipment costs and allowing annealing through thick oxide claddings. The process used also retains CMOS compatibility.

Original languageEnglish
Pages (from-to)2248-2253
Number of pages6
JournalJournal of Lightwave Technology
Volume32
Issue number12
DOIs
Publication statusPublished - 15 Jun 2014

Keywords

  • Gratings
  • optical components
  • optical couplers
  • optical coupling
  • optical diffraction
  • optical planar waveguide couplers
  • periodic structures
  • CONTINUOUS-WAVE LASER
  • GRATING COUPLERS
  • THIN-FILMS
  • PHOTONICS
  • MODULATOR
  • GUIDES
  • SOI

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