TY - GEN
T1 - High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography
AU - Welna, Karl
AU - Debnath, Kapil
AU - Dumon, Pieter
AU - Khanna, Amit
AU - Krauss, Thomas F.
AU - O'Faolain, Liam
N1 - This project was supported the EraNET Nano-Sci project LECSIN and by a European Research Council Starting Grant (no. 337508).
PY - 2014
Y1 - 2014
N2 - Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.
AB - Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.
UR - https://www.scopus.com/pages/publications/84914178200
U2 - 10.1109/Group4.2014.6961997
DO - 10.1109/Group4.2014.6961997
M3 - Conference contribution
SN - 978-1-4799-2282-6
T3 - IEEE International Conference on Group IV Photonics
SP - 161
EP - 162
BT - 2014 IEEE 11th International Conference on Group IV Photonics (GFP)
PB - IEEE
CY - New York
T2 - 11th IEEE International Conference on Group IV Photonics (GFP)
Y2 - 27 August 2014 through 29 August 2014
ER -