High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography

Karl Welna*, Kapil Debnath, Pieter Dumon, Amit Khanna, Thomas F. Krauss, Liam O'Faolain

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.

Original languageEnglish
Title of host publication2014 IEEE 11th International Conference on Group IV Photonics (GFP)
Place of PublicationNew York
PublisherIEEE
Pages161-162
Number of pages2
ISBN (Print)978-1-4799-2282-6
DOIs
Publication statusPublished - 2014
Event11th IEEE International Conference on Group IV Photonics (GFP) - Paris, France
Duration: 27 Aug 201429 Aug 2014

Publication series

NameIEEE International Conference on Group IV Photonics
PublisherIEEE
ISSN (Print)1949-2081

Conference

Conference11th IEEE International Conference on Group IV Photonics (GFP)
Country/TerritoryFrance
Period27/08/1429/08/14

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