High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography

Karl Welna; Kapil Debnath; Pieter Dumon; Amit Khanna; Thomas F. Krauss; Liam O'Faolain

doi:10.1109/Group4.2014.6961997

High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography

Karl Welna^*, Kapil Debnath, Pieter Dumon, Amit Khanna, Thomas F. Krauss, Liam O'Faolain

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.

Original language	English
Title of host publication	2014 IEEE 11th International Conference on Group IV Photonics (GFP)
Place of Publication	New York
Publisher	IEEE
Pages	161-162
Number of pages	2
ISBN (Print)	978-1-4799-2282-6
DOIs	https://doi.org/10.1109/Group4.2014.6961997
Publication status	Published - 2014
Event	11th IEEE International Conference on Group IV Photonics (GFP) - Paris, France Duration: 27 Aug 2014 → 29 Aug 2014

Publication series

Name	IEEE International Conference on Group IV Photonics
Publisher	IEEE
ISSN (Print)	1949-2081

Conference

Conference	11th IEEE International Conference on Group IV Photonics (GFP)
Country/Territory	France
Period	27/08/14 → 29/08/14

Access to Document

10.1109/Group4.2014.6961997

DANCeR: DANCeR
O'Faolain, L. (PI)
European Research Council
1/12/13 → 31/05/19
Project: Standard

Cite this

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title = "High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography",

abstract = "Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.",

author = "Karl Welna and Kapil Debnath and Pieter Dumon and Amit Khanna and Krauss, {Thomas F.} and Liam O'Faolain",

note = "This project was supported the EraNET Nano-Sci project LECSIN and by a European Research Council Starting Grant (no. 337508).; 11th IEEE International Conference on Group IV Photonics (GFP) ; Conference date: 27-08-2014 Through 29-08-2014",

year = "2014",

doi = "10.1109/Group4.2014.6961997",

language = "English",

isbn = "978-1-4799-2282-6",

series = "IEEE International Conference on Group IV Photonics",

publisher = "IEEE",

pages = "161--162",

booktitle = "2014 IEEE 11th International Conference on Group IV Photonics (GFP)",

}

Welna, K, Debnath, K, Dumon, P, Khanna, A, Krauss, TF & O'Faolain, L 2014, High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography. in 2014 IEEE 11th International Conference on Group IV Photonics (GFP). IEEE International Conference on Group IV Photonics, IEEE, New York, pp. 161-162, 11th IEEE International Conference on Group IV Photonics (GFP), France, 27/08/14. https://doi.org/10.1109/Group4.2014.6961997

High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography. / Welna, Karl; Debnath, Kapil; Dumon, Pieter et al.
2014 IEEE 11th International Conference on Group IV Photonics (GFP). New York: IEEE, 2014. p. 161-162 (IEEE International Conference on Group IV Photonics).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography

AU - Welna, Karl

AU - Debnath, Kapil

AU - Dumon, Pieter

AU - Khanna, Amit

AU - Krauss, Thomas F.

AU - O'Faolain, Liam

N1 - This project was supported the EraNET Nano-Sci project LECSIN and by a European Research Council Starting Grant (no. 337508).

PY - 2014

Y1 - 2014

N2 - Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.

AB - Deep Ultraviolet Lithography is essential for the mass production of silicon devices. To date, restrictions in the process have prevented the realization of high Q factor optical resonators. Here, we demonstrate Q-factor values of approx. 200,000 using an optimized design.

U2 - 10.1109/Group4.2014.6961997

DO - 10.1109/Group4.2014.6961997

M3 - Conference contribution

SN - 978-1-4799-2282-6

T3 - IEEE International Conference on Group IV Photonics

SP - 161

EP - 162

BT - 2014 IEEE 11th International Conference on Group IV Photonics (GFP)

PB - IEEE

CY - New York

T2 - 11th IEEE International Conference on Group IV Photonics (GFP)

Y2 - 27 August 2014 through 29 August 2014

ER -

High Q Photonic Crystal cavities realised using Deep Ultraviolet Lithography

Abstract

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Projects

DANCeR: DANCeR

Cite this