Abstract
Al0.6Ga0.4As/GaAs/Al0.6Ga0.4As double-barrier resonant-tunneling diodes (RTD) were grown by molecular beam epitaxy with a nearby, lattice-matched Ga0.89In0.11N0.04As0.96 absorption layer. RTD mesas with ring contacts and an aperture for optical excitation of charge carriers were fabricated on the epitaxial layers. Electrical and optical properties of the RTDs were investigated for different thicknesses of a thin GaAs spacer layer incorporated between the AlGaAs tunnel barrier adjacent to the GaInNAs absorption layer. Illumination of the RTDs with laser light of 1.3 mu m wavelength leads to a pronounced photo- effect with a sensitivities of around 10(3) A/W. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4709421]
Original language | English |
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Article number | 172113 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 100 |
Issue number | 17 |
DOIs | |
Publication status | Published - 23 Apr 2012 |
Keywords
- 1.3 MU-M
- EPITAXY
- GAAS