Electrode modification by electron-induced patterning of aromatic self-assembled monolayers

T Felgenhauer, C Yan, W Geyer, H-T Rong, A Gölzh, Manfred Buck

Research output: Other contribution

66 Citations (Scopus)

Abstract

Self-assembled monolayers of omega-(4'-methyl-biphenyl-4-yl)-dodecyl thiol [CH3-C6H4-C6H4-(CH2)(12)-SH,BP12] on gold were patterned via exposure to 300 eV electrons. Subsequent copper deposition in an electrochemical cell revealed behavior opposite to that of electron beam patterned monolayers of alkanethiols. Whereas alkanethiols act as a positive resist and lead to copper deposition only on irradiated parts, the biphenyl based thiol acts as a negative resist. At the irradiated areas the layer exhibits blocking behavior and copper deposition is observed only on the nonirradiated parts. (C) 2001 American Institute of Physics.

Original languageEnglish
Volume79
Publication statusPublished - 12 Nov 2001

Keywords

  • INDUCED DAMAGE
  • LITHOGRAPHY
  • GENERATION
  • RESISTS
  • FILMS
  • BEAMS

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