Abstract
Back electron transfer can be reduced by inserting an energy barrier layer at the interfaces of a photoanode is an effective method for improving the photovoltaic parameters in dye sensitised solar cells (DSSCs). In this work phase modified Nb2O5 blocking layer was inserted at the fluorine doped tin oxide (FTO) /TiO2 interface by Rf magnetron sputtering process. For a tunnelling distance of ∼40 nm, crystalline Nb2O5 blocking layer improved the efficiency close to 7% and outperformed the amorphous blocking layer. Longer electron lifetime in DSSCs having inhomogeneous Nb2O5 layer indicates that trapping de-trapping impedes the discharge of electrons to the TiO2 band edge.
Original language | English |
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Title of host publication | 2016 International Conference on Electrical, Electronics, and Optimization Techniques (ICEEOT) |
Publisher | IEEE |
Pages | 3765-3769 |
Number of pages | 5 |
ISBN (Electronic) | 9781467399395 |
ISBN (Print) | 9781467399401 |
DOIs | |
Publication status | Published - 24 Nov 2016 |
Event | International Conference on Electrical, Electronics, and Optimization Techniques (ICEEOT) - DMI College of Engineering Chennai, Tamil Nadu, India Duration: 3 Mar 2016 → 5 Mar 2016 http://www.iceeot.org/index.html |
Conference
Conference | International Conference on Electrical, Electronics, and Optimization Techniques (ICEEOT) |
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Abbreviated title | ICEEOT |
Country/Territory | India |
City | Tamil Nadu |
Period | 3/03/16 → 5/03/16 |
Internet address |
Keywords
- Blocking layer
- Dye sensitised solar cell
- Electrchemical impedance
- Back electron transfer