Determining intrinsic sensitivity and the role of multiple scattering in speckle metrology

Morgan Facchin, Saba N. Khan, Kishan Dholakia, Graham D. Bruce*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Speckle patterns are a powerful tool for high-precision metrology, as they allow remarkable performance in relatively simple setups. Nonetheless, researchers in this field follow rather distinct paths due to underappreciated general principles underlying speckle phenomena. Here, we advise on a universal metric of intrinsic speckle sensitivity, and on the advantages and disadvantages of multiple scattering. This will catalyse progress in speckle metrology but will also translate to other domains of disordered optics which are undergoing rapid developments at present.
Original languageEnglish
Pages (from-to)500-508
JournalNature Reviews Physics
Volume6
Issue number8
Early online date19 Jul 2024
DOIs
Publication statusPublished - Aug 2024

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