Black metals: optical absorbers

Stefan Lundgaard; Soon Hock Ng; Yoshiaki Nishijima; Michael Mazilu; Saulius Juodkazis

doi:10.3390/mi11030256

Black metals: optical absorbers

Stefan Lundgaard^*, Soon Hock Ng, Yoshiaki Nishijima, Michael Mazilu^*, Saulius Juodkazis

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

Abstract

We demonstrate a concept and fabrication of lithography-free layered metal-SiO₂ thin-film structures which have reduced reflectivity (black appearance), to as low as 0.9%, with 4.9% broadband reflectance (8.9% for soda lime) in the 500–1400 nm range. The multi-layered (four layers) thin-film metamaterial is designed so that optical impedance matching produces minimal reflectance and transmittance within the visible and infra-red (IR) spectral region for a range of incident angles. The structure has enhanced absorbance and is easily tuned for reduced minimal transmission and reflection. This approach should allow for novel anti-reflection surfaces by impedance matching to be realized.

Original language	English
Article number	256
Number of pages	10
Journal	Micromachines
Volume	11
Issue number	3
DOIs	https://doi.org/10.3390/mi11030256
Publication status	Published - 28 Feb 2020

Keywords

Metamaterial
Optical absorber
Thin-film optics

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10.3390/mi11030256Licence: CC BY

Lundgaard_2020_Micomachines_Blackmetals_CC
Copyright © 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
Final published version, 1.78 MBLicence: CC BY

https://www.preprints.org/manuscript/202002.0138/v1

Shaped light at the interface: Shaped Light at the Interface
Dholakia, K. (PI), Brown, C. T. A. (CoI), Di Falco, A. (CoI) & Mazilu, M. (CoI)
EPSRC
1/09/14 → 31/08/19
Project: Standard

Cite this

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title = "Black metals: optical absorbers",

abstract = "We demonstrate a concept and fabrication of lithography-free layered metal-SiO2 thin-film structures which have reduced reflectivity (black appearance), to as low as 0.9%, with 4.9% broadband reflectance (8.9% for soda lime) in the 500–1400 nm range. The multi-layered (four layers) thin-film metamaterial is designed so that optical impedance matching produces minimal reflectance and transmittance within the visible and infra-red (IR) spectral region for a range of incident angles. The structure has enhanced absorbance and is easily tuned for reduced minimal transmission and reflection. This approach should allow for novel anti-reflection surfaces by impedance matching to be realized. ",

keywords = "Metamaterial, Optical absorber, Thin-film optics",

author = "Stefan Lundgaard and {Hock Ng}, Soon and Yoshiaki Nishijima and Michael Mazilu and Saulius Juodkazis",

note = "This research was funded by the Melbourne University administrated DSI-RHD 2018, ARC Discovery DP190103284, Linkage LP190100505 grants, and EPSRC EP/M000869/1.",

year = "2020",

month = feb,

day = "28",

doi = "10.3390/mi11030256",

language = "English",

volume = "11",

journal = "Micromachines",

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TY - JOUR

T1 - Black metals

T2 - optical absorbers

AU - Lundgaard, Stefan

AU - Hock Ng, Soon

AU - Nishijima, Yoshiaki

AU - Mazilu, Michael

AU - Juodkazis, Saulius

N1 - This research was funded by the Melbourne University administrated DSI-RHD 2018, ARC Discovery DP190103284, Linkage LP190100505 grants, and EPSRC EP/M000869/1.

PY - 2020/2/28

Y1 - 2020/2/28

N2 - We demonstrate a concept and fabrication of lithography-free layered metal-SiO2 thin-film structures which have reduced reflectivity (black appearance), to as low as 0.9%, with 4.9% broadband reflectance (8.9% for soda lime) in the 500–1400 nm range. The multi-layered (four layers) thin-film metamaterial is designed so that optical impedance matching produces minimal reflectance and transmittance within the visible and infra-red (IR) spectral region for a range of incident angles. The structure has enhanced absorbance and is easily tuned for reduced minimal transmission and reflection. This approach should allow for novel anti-reflection surfaces by impedance matching to be realized.

AB - We demonstrate a concept and fabrication of lithography-free layered metal-SiO2 thin-film structures which have reduced reflectivity (black appearance), to as low as 0.9%, with 4.9% broadband reflectance (8.9% for soda lime) in the 500–1400 nm range. The multi-layered (four layers) thin-film metamaterial is designed so that optical impedance matching produces minimal reflectance and transmittance within the visible and infra-red (IR) spectral region for a range of incident angles. The structure has enhanced absorbance and is easily tuned for reduced minimal transmission and reflection. This approach should allow for novel anti-reflection surfaces by impedance matching to be realized.

KW - Metamaterial

KW - Optical absorber

KW - Thin-film optics

U2 - 10.3390/mi11030256

DO - 10.3390/mi11030256

M3 - Article

SN - 2072-666X

VL - 11

JO - Micromachines

JF - Micromachines

IS - 3

M1 - 256

ER -

Black metals: optical absorbers

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Shaped light at the interface: Shaped Light at the Interface

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