Abstract
The band bending and carrier concentration profiles as a function of depth below the surface for oxidized InxGa1-xN alloys with a composition range of 0.39 <= x <= 1.00 are investigated using x-ray photoelectron, infrared reflection, and optical absorption spectroscopies, and solutions of Poisson's equation within a modified Thomas-Fermi approximation. All of these InGaN samples exhibit downward band bending ranging from 0.19 to 0.66 eV and a high surface sheet charge density ranging from 5.0 x 10(12) to 1.5 x 10(13) cm(-2). The downward band bending is more pronounced in the most In-rich InGaN samples, resulting in larger near-surface electron concentrations. c 2008 American Institute of Physics. [DOI: 10.1063/1.3033373]
Original language | English |
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Pages (from-to) | 113716 |
Number of pages | 6 |
Journal | Journal of Applied Physics |
Volume | 104 |
Issue number | 11 |
DOIs | |
Publication status | Published - 1 Dec 2008 |
Keywords
- ACCUMULATION LAYERS
- INFRARED REFLECTIVITY
- ELECTRON ACCUMULATION
- ATOMIC-HYDROGEN
- N-TYPE
- GAP
- NITRIDE
- FILMS
- GAN(0001)-(1X1)
- SEMICONDUCTORS