Array based test structure for optical-electrical overlay calibration

B. J.R. Shulver; R. A. Allen; A. J. Walton; M. W. Cresswell'; J. T.M. Stevenson; S. Smith; A. S. Bunting; C. Dunare; A. M. Gundlach; L. I. Haworth; A. W.S. Ross; A. J. Snell

doi:10.1109/ICMTS.2007.374476

Array based test structure for optical-electrical overlay calibration

B. J.R. Shulver^*, R. A. Allen, A. J. Walton, M. W. Cresswell', J. T.M. Stevenson, S. Smith, A. S. Bunting, C. Dunare, A. M. Gundlach, L. I. Haworth, A. W.S. Ross, A. J. Snell

^*Corresponding author for this work

School of Physics and Astronomy

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The novel overlay test structure reported in this paper was purposely designed to serve as an applicationspecific reference material. It features standard frame-inframe optical overlay targets embedded in electrical test features and fabricated by the same process as the parts being manufactured. Optical overlay is commonly used in process control applications due to its utility for determining the relative positions of features patterned in photoresist, Electrical overlay, although it can only be measured on fully patterned test structures, is the metric of interest. Using this combined optical/electrical overlay test structure, we can derive the relationship between the routinely measured optical overlay and the electrical overlay for any specific combination of process and optical overlay tool.

Original language	English
Title of host publication	2007 IEEE International Conference on Microelectronic Test Structures, ICMTS - Conference Proceedings
Pages	165-170
Number of pages	6
DOIs	https://doi.org/10.1109/ICMTS.2007.374476
Publication status	Published - 27 Sept 2007
Event	2007 IEEE International Conference on Microelectronic Test Structures, ICMTS '07 - Bunkyo-ku, Japan Duration: 19 Mar 2007 → 22 Mar 2007

Conference

Conference	2007 IEEE International Conference on Microelectronic Test Structures, ICMTS '07
Country/Territory	Japan
City	Bunkyo-ku
Period	19/03/07 → 22/03/07

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Shulver, B. J. R., Allen, R. A., Walton, A. J., Cresswell', M. W., Stevenson, J. T. M., Smith, S., Bunting, A. S., Dunare, C., Gundlach, A. M., Haworth, L. I., Ross, A. W. S., & Snell, A. J. (2007). Array based test structure for optical-electrical overlay calibration. In 2007 IEEE International Conference on Microelectronic Test Structures, ICMTS - Conference Proceedings (pp. 165-170). Article 4252426 https://doi.org/10.1109/ICMTS.2007.374476

@inproceedings{149122ca1918442ea4bc1f99626e07ac,

title = "Array based test structure for optical-electrical overlay calibration",

abstract = "The novel overlay test structure reported in this paper was purposely designed to serve as an applicationspecific reference material. It features standard frame-inframe optical overlay targets embedded in electrical test features and fabricated by the same process as the parts being manufactured. Optical overlay is commonly used in process control applications due to its utility for determining the relative positions of features patterned in photoresist, Electrical overlay, although it can only be measured on fully patterned test structures, is the metric of interest. Using this combined optical/electrical overlay test structure, we can derive the relationship between the routinely measured optical overlay and the electrical overlay for any specific combination of process and optical overlay tool.",

author = "Shulver, {B. J.R.} and Allen, {R. A.} and Walton, {A. J.} and Cresswell', {M. W.} and Stevenson, {J. T.M.} and S. Smith and Bunting, {A. S.} and C. Dunare and Gundlach, {A. M.} and Haworth, {L. I.} and Ross, {A. W.S.} and Snell, {A. J.}",

year = "2007",

month = sep,

day = "27",

doi = "10.1109/ICMTS.2007.374476",

language = "English",

isbn = "142440780X",

pages = "165--170",

booktitle = "2007 IEEE International Conference on Microelectronic Test Structures, ICMTS - Conference Proceedings",

note = "2007 IEEE International Conference on Microelectronic Test Structures, ICMTS '07 ; Conference date: 19-03-2007 Through 22-03-2007",

}

Shulver, BJR, Allen, RA, Walton, AJ, Cresswell', MW, Stevenson, JTM, Smith, S, Bunting, AS, Dunare, C, Gundlach, AM, Haworth, LI, Ross, AWS & Snell, AJ 2007, Array based test structure for optical-electrical overlay calibration. in 2007 IEEE International Conference on Microelectronic Test Structures, ICMTS - Conference Proceedings., 4252426, pp. 165-170, 2007 IEEE International Conference on Microelectronic Test Structures, ICMTS '07, Bunkyo-ku, Japan, 19/03/07. https://doi.org/10.1109/ICMTS.2007.374476

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AU - Allen, R. A.

AU - Walton, A. J.

AU - Cresswell', M. W.

AU - Stevenson, J. T.M.

AU - Smith, S.

AU - Bunting, A. S.

AU - Dunare, C.

AU - Gundlach, A. M.

AU - Haworth, L. I.

AU - Ross, A. W.S.

AU - Snell, A. J.

PY - 2007/9/27

Y1 - 2007/9/27

N2 - The novel overlay test structure reported in this paper was purposely designed to serve as an applicationspecific reference material. It features standard frame-inframe optical overlay targets embedded in electrical test features and fabricated by the same process as the parts being manufactured. Optical overlay is commonly used in process control applications due to its utility for determining the relative positions of features patterned in photoresist, Electrical overlay, although it can only be measured on fully patterned test structures, is the metric of interest. Using this combined optical/electrical overlay test structure, we can derive the relationship between the routinely measured optical overlay and the electrical overlay for any specific combination of process and optical overlay tool.

AB - The novel overlay test structure reported in this paper was purposely designed to serve as an applicationspecific reference material. It features standard frame-inframe optical overlay targets embedded in electrical test features and fabricated by the same process as the parts being manufactured. Optical overlay is commonly used in process control applications due to its utility for determining the relative positions of features patterned in photoresist, Electrical overlay, although it can only be measured on fully patterned test structures, is the metric of interest. Using this combined optical/electrical overlay test structure, we can derive the relationship between the routinely measured optical overlay and the electrical overlay for any specific combination of process and optical overlay tool.

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U2 - 10.1109/ICMTS.2007.374476

DO - 10.1109/ICMTS.2007.374476

M3 - Conference contribution

AN - SCOPUS:34548857640

SN - 142440780X

SN - 9781424407804

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BT - 2007 IEEE International Conference on Microelectronic Test Structures, ICMTS - Conference Proceedings

T2 - 2007 IEEE International Conference on Microelectronic Test Structures, ICMTS '07

Y2 - 19 March 2007 through 22 March 2007

ER -

Array based test structure for optical-electrical overlay calibration

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