Anodic formation of nanoporous and nanotubular metal oxides

A localized dielectric breakdown model with good universality is introduced to explain the pore initiation, separation and growth processes of nanoporous and nanotubular anodic metal oxides. It is suggested that the degree of localized dielectric breakdown, which is mainly determined by the dielectric strength and energy band gap of the anodic oxide, electrolyte used, anodizing field and also temperature during anodization, has a significant effect on the pore formation. Continuous nanoporous films tend to grow under low degree of localized dielectric breakdown of the anodic oxides, and the growth in number and size of voids induced by high degree of localized dielectric breakdown at the inter-pore areas leads to the separation of neighbouring pores and, therefore, formation of nanotubular structures. Specially, anodic TiO2 nanotubes are believed to grow by continuous localized dielectric breakdown and self-healing processes at the base of main pores. Alternating dielectric breakdown and oxidation processes at the inter-pores areas lead to the formation of commonly observed O-ring like ridges.