Advanced high-k dielectric amorphous LaGdO3 based high density metal-insulator-metal capacitors with sub-nanometer capacitance equivalent thickness

S. P. Pavunny*, P. Misra, J. F. Scott, R. S. Katiyar

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

14 Citations (Scopus)

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