A Supramolecular Hydrogen-Bonded Network as a Diffusion Barrier for Metal Adatoms

C. Silien; M.T. Räisänen; Manfred Buck

doi:10.1002/anie.200806267

A Supramolecular Hydrogen-Bonded Network as a Diffusion Barrier for Metal Adatoms

C. Silien, M.T. Räisänen, Manfred Buck

Research output: Contribution to journal › Article › peer-review

Abstract

Confined in a molecular corral: A supramolecular network changes the mechanism by which underpotential deposition (UPD) of copper proceeds on a gold electrode modified by a self-assembled monolayer (SAM). Lateral diffusion of Cu adatoms is suppressed between adjacent cells of a network/SAM hybrid structure. Instead, UPD occurs by direct deposition into the SAM filled pores of the network, where the Cu adatoms are confined.

Original language	English
Pages (from-to)	3349-3352
Journal	Angewandte Chemie International Edition
Volume	48
Issue number	18
DOIs	https://doi.org/10.1002/anie.200806267
Publication status	Published - 2009

Access to Document

10.1002/anie.200806267

Cite this

@article{afabe0e4ba2b4e0ab1f8c7d6310ca887,

title = "A Supramolecular Hydrogen-Bonded Network as a Diffusion Barrier for Metal Adatoms",

abstract = "Confined in a molecular corral: A supramolecular network changes the mechanism by which underpotential deposition (UPD) of copper proceeds on a gold electrode modified by a self-assembled monolayer (SAM). Lateral diffusion of Cu adatoms is suppressed between adjacent cells of a network/SAM hybrid structure. Instead, UPD occurs by direct deposition into the SAM filled pores of the network, where the Cu adatoms are confined.",

author = "C. Silien and M.T. R{\"a}is{\"a}nen and Manfred Buck",

year = "2009",

doi = "10.1002/anie.200806267",

language = "English",

volume = "48",

pages = "3349--3352",

journal = "Angewandte Chemie International Edition",

issn = "1433-7851",

publisher = "John Wiley & Sons, Ltd",

number = "18",

}

TY - JOUR

T1 - A Supramolecular Hydrogen-Bonded Network as a Diffusion Barrier for Metal Adatoms

AU - Silien, C.

AU - Räisänen, M.T.

AU - Buck, Manfred

PY - 2009

Y1 - 2009

N2 - Confined in a molecular corral: A supramolecular network changes the mechanism by which underpotential deposition (UPD) of copper proceeds on a gold electrode modified by a self-assembled monolayer (SAM). Lateral diffusion of Cu adatoms is suppressed between adjacent cells of a network/SAM hybrid structure. Instead, UPD occurs by direct deposition into the SAM filled pores of the network, where the Cu adatoms are confined.

AB - Confined in a molecular corral: A supramolecular network changes the mechanism by which underpotential deposition (UPD) of copper proceeds on a gold electrode modified by a self-assembled monolayer (SAM). Lateral diffusion of Cu adatoms is suppressed between adjacent cells of a network/SAM hybrid structure. Instead, UPD occurs by direct deposition into the SAM filled pores of the network, where the Cu adatoms are confined.

UR - http://www.scopus.com/inward/record.url?scp=70349900161&partnerID=8YFLogxK

U2 - 10.1002/anie.200806267

DO - 10.1002/anie.200806267

M3 - Article

SN - 1433-7851

VL - 48

SP - 3349

EP - 3352

JO - Angewandte Chemie International Edition

JF - Angewandte Chemie International Edition

IS - 18

ER -

A Supramolecular Hydrogen-Bonded Network as a Diffusion Barrier for Metal Adatoms

Abstract

Access to Document

Other files and links

Fingerprint

Micro-and Nanoelectrode structure: Micro and nanoelectrode structures by template directed electrodeposition

Cite this

A Supramolecular Hydrogen-Bonded Network as a Diffusion Barrier for Metal Adatoms

Abstract

Access to Document

Other files and links

Fingerprint

Projects

Micro-and Nanoelectrode structure: Micro and nanoelectrode structures by template directed electrodeposition

Cite this